Talk:Ion beam lithography: Difference between revisions
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This article originally looked like an advertisement for Leung Research group. There is already a well-developed article on focused ion beam. I re-wrote this article to link to Focused Ion Beam and give the opportunity for more maskless ion beam content.[[Special:Contributions/218.168.211.81|218.168.211.81]] ([[User talk:218.168.211.81|talk]]) 20:19, 13 May 2008 (UTC) |
This article originally looked like an advertisement for Leung Research group. There is already a well-developed article on focused ion beam. I re-wrote this article to link to Focused Ion Beam and give the opportunity for more maskless ion beam content.[[Special:Contributions/218.168.211.81|218.168.211.81]] ([[User talk:218.168.211.81|talk]]) 20:19, 13 May 2008 (UTC) |
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Revision as of 06:42, 6 November 2015
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This article originally looked like an advertisement for Leung Research group. There is already a well-developed article on focused ion beam. I re-wrote this article to link to Focused Ion Beam and give the opportunity for more maskless ion beam content.218.168.211.81 (talk) 20:19, 13 May 2008 (UTC)
Since this technique is still in experiment phase and not well-developed, this article should be categorized under Charged Particle Lithography, the more general term used for similar techniques. This will broaden the scope and facilitate quality writing. Sabih Omar 11:45, 24 August 2009 (UTC) —Preceding unsigned comment added by Sabih omar (talk • contribs)