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Talk:Ion beam lithography

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This is an old revision of this page, as edited by WikiSabih (talk | contribs) at 11:45, 24 August 2009. The present address (URL) is a permanent link to this revision, which may differ significantly from the current revision.

This article originally looked like an advertisement for Leung Research group. There is already a well-developed article on focused ion beam. I re-wrote this article to link to Focused Ion Beam and give the opportunity for more maskless ion beam content.218.168.211.81 (talk) 20:19, 13 May 2008 (UTC)[reply]

Since this technique is still in experiment phase and not well-developed, this article should be categorized under Charged Particle Lithography, the more general term used for similar techniques. This will broaden the scope and facilitate quality writing. Sabih Omar 11:45, 24 August 2009 (UTC)

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