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Summary

Description The diffraction pattern from a given feature layout varies with illumination, corresponding to different locations in the pupil. These are represented by the different colors in the example. Larger pitches result in more diffraction patterns [1][2].
Date
Source Power Point
Author Guiding light
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Original upload log

The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2020-07-12 11:43:40 172 × 149 Guiding light
2020-07-12 07:56:50 182 × 149 Guiding light
2020-07-12 06:36:57 182 × 149 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

References

  1. Stochastic Considerations of Multi-Point Source Illumination in Lithography
  2. Stochastic Effects from Photon Distribution Entropy in High-k1 EUV Lithography

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12 July 2020

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Date/TimeThumbnailDimensionsUserComment
current22:45, 20 July 2021Thumbnail for version as of 22:45, 20 July 2021949 × 404 (66 KB)Guiding lightreplaced drawing
01:00, 13 August 2020Thumbnail for version as of 01:00, 13 August 2020172 × 149 (5 KB)OgreBot(BOT): Reverting to most recent version before archival
01:00, 13 August 2020Thumbnail for version as of 01:00, 13 August 2020182 × 149 (4 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2020-07-12 07:56:50 by Guiding light
01:00, 13 August 2020Thumbnail for version as of 01:00, 13 August 2020182 × 149 (4 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2020-07-12 06:36:57 by Guiding light
20:23, 11 August 2020Thumbnail for version as of 20:23, 11 August 2020172 × 149 (5 KB)MrTransferTransferred from en.wikipedia (MTC!) (1.1.0)
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