Jump to content

Indium gallium aluminium nitride

From Wikipedia, the free encyclopedia

Indium gallium aluminium nitride (InGaAlN, AlInGaN) is a GaN-based compound semiconductor. It is usually prepared by epitaxial growth, such as metalorganic chemical vapour deposition (MOCVD), molecular-beam epitaxy (MBE), pulsed laser deposition (PLD), etc.[citation needed] This material is used for specialist opto-electronics applications, often in blue laser diodes and LEDs.

See also

[edit]

References

[edit]